SUSS MicroOptics - High Quality Microlens Arrays


  • June 2009SUSS MicroTec launches with the MO Exposure Optics a new illumination system designed for all generations of manual and automatic SUSS mask aligners. The new optics is based on unique and high quality microlens arrays to provide higher intensity, improved exposure light uniformity and customized illumination shaping to further optimize the process window and yield in contact and proximity lithography. MO Exposure Optics (patent pending) has been exclusively developed by SUSS MicroOptics.